Process for producing multicolor display

ABSTRACT

The present invention provides an improved process for producing a multicolor display by which a color filter having neither coloring failure nor size failure is obtained. 
     The present invention provides a process comprising: 
     (I) a photosensitive resin layer formed on an electric conductive layer is exposed to light through a mask having a desired pattern which is placed on the photosensitive resin layer, and developed to bare partially the surface of the electric conductive layer; 
     (II) a colored layer is formed on the bared surface of the electric conductive layer by an electrodepositing process; and 
     (III) the above steps (I) and (II) are repeated desired times and then the remaining photosensitive resin layer is eluted with a removing solution which preferentially or selectively dissolves the photosensitive layer, to bare the remaining surface of the electric conductive layer.

FIELD OF THE INVENTION

The present invention relates to a process for producing a multicolordisplay which is used for multicoloring display elements, such as aliquid crystal element and the like.

BACKGROUND OF THE INVENTION

A variety of processes for forming a color filter have been reported.Among them, the process employing electrodeposition is noticeable in theart. For example, Japanese Patent Application Ser. No. 3-12018 andJapanese Patent Kokai Publication No. 61-272720, the former filed by thepresent assignee, disclose the process comprising: forming anelectroconductive layer on a substrate; forming a positive typephotosensitive film thereon; pattern-wise exposing the film; removingthe exposed part; and forming a desired colored layer byelectrodeposition. Since a positive type photosensitive film is employedin this process, it is ideal that only the exposed part of the film issolubilized to a developer, whereby, the remaining photosensitive filmstill keeps photosensitivity and can repeat exposure and development.

However, in activity, the positive type photosensitive film adjacent tothe edge of the formed colored layer is likely to be modified during thefirst developing, electrodepositing and heat curing and losephotosensitivity. The modified portion, in the subsequent colored layerforming process, often causes coloring failure, such as frame-likediscoloration, or size failure, such as irregular pattern edge lines(see FIG. 9).

The present invention provides an improved process for producing amulticolor display by which a color filter having neither the coloringfailure nor the size failure is obtained.

DISCLOSURE OF THE INVENTION

That is, the present invention provides a process for producing amulticolor display comprising the following steps:

(I) a photosensitive resin layer formed on an electric conductive layeris exposed to light through a mask having a desired pattern which isplaced on the photosensitive resin layer, and developed to barepartially the surface of the electric conductive layer;

(II) a colored layer is formed on the bared surface of the electricconductive layer by an electrodepositing process; and

(III) the above steps (I) and (II) are repeated desired times and thenthe remaining photosensitive resin layer is eluted with a removingsolution which preferentially or selectively dissolves thephotosensitive layer, to bare the remaining surface of the electricconductive layer.

The process above mentioned according to the present invention mayfurther comprise any one of the following steps after said step (III):

(IV) a colored layer is formed on the bared remaining surface of theelectric conductive layer by an electrodepositing process;

(V) a colored layer is formed on the bared remaining surface of theelectric conductive layer by a coating process;

(VI) a colored layer is formed on the bared remaining surface of theelectric conductive layer by a metallic plating process; or

(VII) the bared remaining surface of the electric conductive layer iscolored by an oxidation or reduction process.

A substrate as shown in FIG. 1(a) or 1(b) has to be provided first. Anysubstrate can be employed as long as its surface has electricconductivity. For example, a composite of insulation base 1 such asglass or plastics with thin electric conductive layer 2 such aschromium, nickel or indium oxide formed thereon, as well as an intrinsicelectric conductive substrate 1' such as iron, stainless steel or copperare employed. The composite substrate as shown in FIG. 1(a) is employedfor the following description.

A positive photosensitive resin layer 3 is formed on the electricconductive layer 2 as shown in FIG. 1(c). The positive typephotosensitive resin layer once formed can be pattern-wise exposed anddeveloped repeatedly without additional application thereof. Thepositive type photosensitive resin layer can be formed from a resincomposition which comprises a polymer having branched groups unstable tocarboxylic acid and a photopolymerization initiator which produces acidupon exposure to light (see, for example, Japanese Patent ApplicationSer. No. 3-12018 filed by the present assignee).

The polymer having branched groups unstable to carboxylic acid is ahomopolymer or a copolymer of monomers having branched groups unstableto carboxylic acid. Examples of the monomers having branched groupsunstable to carboxylic acid include p-butoxycarbonyloxy-α-methylstyrene,p-t-butoxycarbonyloxystyrene, t-butyl-p-vinyl benzoate,t-butyl-p-isopropenylphenyloxy acetate, t-butyl-methacrylate and thelike. Examples of the comonomers copolymerizable with the monomersinclude monoolefinic and diolefinic hydrocarbons. Thephotopolymerization initiator has been known to the art, and include,for example, onium salts.

A mask 4 having a desired pattern is then placed on the positive typephotosensitive layer 3 (FIG. 1(d)), the photosensitive resin layer ispattern-wise solubilized by exposing to light through the mask, and thesolubilized part of the photosensitive resin layer is eluted to obtainthe patterned substrate (FIG. 1(e)). Masking and eluting processemployed are known to the art. As shown in FIG. 1(e), the resultingpatterned substrate has two bared sites of the electric conductive layer2. The patterned substrate is then dipped into an electrodepositionbath, and electric current is applied to the electric conductive layer 2to form the colored layer, for example, red layer (R) 5 as shown in FIG.1(f).

Any synthetic polymer resin selected from cationic, anionic andampholytic resin, including those known to the art such as acrylic,epoxy, urethane, polybutadiene, polyamide, carboxyl group introducedpolybutadiene and carboxyl group introduced alkyd resin is employed fora film forming component of the electrodeposition bath. In selecting thesynthetic polymer resin, however, care should be taken not to employ anionic polymer which deteriorates the electric conductive layer 2.Japanese Patent Kokai Publication No. 59-114592 and 63-210901 filed bythe present assignee disclose the electrodeposition bath or others inmore detail. Either photocurable or thermocurable electrodepositablepaint may be employed in the present invention.

Another mask 4' is then placed on the surface of the colored layer andthe positive type photosensitive layer 3 as shown in FIG. 1(g), thephotosensitive resin layer is pattern-wise solubilized and eluted asdescribed above, and another patterned substrate (FIG. 1(h)) isprovided. If the mask 4' is the same as mask 4, a position of the maskon the photosensitive resin layer will have to be shifted.

The patterned substrate is dipped into the electrodeposition bath, andelectric current is applied to the electric conductive layer 2 to formthe colored layer, for example, green layer (G) 6 as shown in FIG. 2(i).

Further by again conducting the steps shown in FIG. 1(g)-(h) and FIG.2(i), another colored layer, for example, blue (B) 7 is formed (FIG. 2(j)-(l)). Similarly to that noted above, if the mask 4" is the same asmask 4 or 4', a position of the mask on the photosensitive resin layerwill have to be shifted.

Coloring (e.g., black coloring) the electric conductive layer surfaceoutside the colored layer is one embodiment of the present invention. Insuch case, the remaining photosensitive layer on the electric conductivelayer surface (FIG. 2(l)) is selectively eluted with removing solutionto obtain the substrate having bared electric conductive layer (FIG.3(m)). The removing solution employed differs from developing solutionused for patterning in its components or composition ratio.

The colored layer, for example, black layer (Bl) 8 shown in FIG. 3(n) isformed by dipping the patterned substrate into the electrodepositionbath, and applying electric current to the electric conductive layer 2.

Forming patterned colored layer on the surface of the electricconductive layer on addition to the colored layer noted above (R, G, B)is another embodiment of the present invention. In Such case, thecolored layer, for example, black layer (Bl) 9 is formed according tothe steps described for forming colored layer (R, G, B) as shown in FIG.4(o)-(q).

The remaining photosensitive layer over the electric conductive layersurface (FIG. 4(q)) is then selectively eluted out with the removingsolution to obtain substrate having bared electric conductive layer(FIG. 4(r)). The removing solution employed differs from developingsolution used for patterning in its component or composition ratio.

The colored layer, for example, clear layer (C) 10 shown in FIG. 4(s) isformed by dipping the patterned substrate into an electrodepositionbath, and applying electric current to the electric conductive layer 2.

After the colored layer is formed, it is possible to use the electricconductive layer 2 as electrode other than for electrodepositing (e.g.,for driving) by connecting the electric conductive layer 2 to exteriorelectric power source. In such case, the substrate having bared electricconductive layer 2 (FIG. 4(t)) may also be obtained by, for example,forming colored layer shown in FIG. 4(s) (Bl, C etc.) according tosimilar steps which were described to form the colored layer (R, G, B),and then eluting selectively the photosensitive resin layer. In the casethat colored layer (Bl, C etc.) is unnecessary, the photosensitive layermay be removed using the removing solution above described (FIG. 4(u)).

Plating process employed in the present invention includes electroplating, electroless plating and combination thereof.

According to the present process for producing multicolor display, thecolor filter having random arranged colored layer without coloringfailure and size failure is produced independent of the shape of theelectric conductive layer.

EXAMPLES

The following examples further illustrate the present invention, butthey should not be construed to limit the scope thereof.

Reference Example 1

Preparation of Positive Photosensitive Resin. Composition

Into 50 g of xylene containing 2.0 g of azobisisobutyronitrile wereadded t-butyl methacrylate 65.0 g, butyl acrylate 20.0 g and methylmethacrylate 20.0 g, and stirred for 10 hour at 60° C. under a nitrogenblanket. The cooled reactant was diluted with tetrahydrofuran, andwashed with petroleum ether/methanol. Polymer obtained weighed 93.0 g(93% yield), and had a number average molecular weight of 22000 (GPC).The polymer was dissolved into tetrahydrofuran at an amount providing20% by weight solution, and 20% by weight based on the polymer oftriphenylsulfonium hexafluoroantimonate was added to the solution toobtain positive type photosensitive resin composition.

Reference Example 2

Preparation of Positive Photosensitive Resin Composition DevelopingSolution

The following positive type photosensitive resin composition developingsolution was prepared.

    ______________________________________                                        Sodium hydroxide                                                                              5 parts by weight                                             Pure water     995 parts by weight                                            ______________________________________                                    

Reference Example 3

Preparation of Anionic Electrolyte Bath Solution for Color FilterProduction

The following anionic electrodepositable resin composition was prepared.

    ______________________________________                                        Anionic polyester resin                                                                          95.0 parts by weight                                       Melamine resin     18.0 parts by weight                                       Butyl cellosolve   25.0 parts by weight                                       Ethyl cellosolve   5.0 parts by weight                                        n-Butanol          18.0 parts by weight                                       Triethylamine      2.5 parts by weight                                        Ion exchange water 836.5 parts by weight                                      ______________________________________                                    

The tabulated amount of pigment was combined to the resultingelectrodepositable resin composition to obtain four colored anionicelectrodepositable solutions.

    ______________________________________                                                    Blue  Green     Red     Black                                     ______________________________________                                        Resin composition                                                                           995.0   995.0     995.0 992.5                                   Phthalocyanine blue                                                                         5.0     --        --    --                                      Phthalocyanine green                                                                        --      5.0       --    --                                      Red pigment.sup.1                                                                           --      --        5.0   --                                      Carbon black  --      --        --    7.5                                     ______________________________________                                         .sup.1 Azometal salt red pigment                                         

Reference Example 4

Preparation of Positive Photosensitive Resin Composition RemovingSolution

The following positive type photosensitive resin composition removingsolution 1 was prepared.

    ______________________________________                                        Ethanolamine     85 parts by weight                                           Butyl cellosolve                                                                              115 parts by weight                                           Furfuryl alcohol                                                                              300 parts by weight                                           Dipropylene glycol                                                                            500 parts by weight                                           methyl ether                                                                  ______________________________________                                    

The following positive type photosensitive resin composition removingsolution 2 was prepared by diluting the removing solution 1 with purewater.

    ______________________________________                                        Ethanolamine     68 parts by weight                                           Butyl cellosolve                                                                               92 parts by weight                                           Furfuryl alcohol                                                                              240 parts by weight                                           Dipropylene glycol                                                                            400 parts by weight                                           methyl ether                                                                  Pure water      200 parts by weight                                           ______________________________________                                    

The following positive type photosensitive resin composition removingsolution 3 was prepared.

    ______________________________________                                        Isopropyl alcohol                                                                            90 parts by weight                                             Diethanolamine 10 parts by weight                                             ______________________________________                                    

Reference Example 5

Preparation of Chromium Plating Bath

The following chromium plating bath was prepared.

    ______________________________________                                        Chromic acid anhydride 400.0 g/l                                              Sodium hydroxide        60.0 g/l                                              Barium carbonate        7.5 g/l                                               Silicofluoric acid      1.0 ml/l                                              ______________________________________                                    

Reference Example 6

Preparation of Reducing Electrolyte

Aqueous hydrochloric acid solution having a concentration of 4% wasprepared.

EXAMPLE 1

Onto a glass substrate 1 having clear electric conductive film layer 2(ITO (indium tin oxide)) thereon (FIG. 1(a)), the positive typephotosensitive resin composition of the reference example 1 was appliedusing a spinner, and the applied positive type photosensitive resincomposition was then dried to form a positive type photosensitive resinlayer 3 (FIG. 1(c)).

The layer was then exposed to a high pressure mercury lamp through mask4 having predetermined pattern (FIG. 1(d)), heated at 100° C. for 3minutes, and the exposed part of the layer was eluted with abovementioned positive type photosensitive resin composition developingsolution to bare the surface of the clear electric conductive film layer2. The substrate 1 having the bared surface (FIG. 1(e)) was then dippedinto an electrodeposition bath including red anionic electrodepositablesolution, and a direct current voltage of 30 V was applied to the clearelectric conductive film layer 2 as a positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath, and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. On the other hand, the waterinsoluble polymer deposited onto the voltage applied surface of theclear electric conductive film layer was not removed by rinsing withwater. Subsequent drying provided good, transparent red polymer film 5deposited onto the clear electric conductive layer (FIG. 1(f)). Thecolored polymer film 5 had a thickness of 2 μm.

The positive type photosensitive resin layer was again exposed to thehigh pressure mercury lamp through another mask 4' having shiftedpattern (FIG. 1(g)), heated at 100° C. for 3 minutes, and developed withthe positive type photosensitive resin composition developing solutionto bare the surface of the clear electric conductive film layer 2. Thesubstrate 1 having bared surface (FIG. 1(h)) was then dipped into anelectrodeposition bath including green anionic electrodepositablesolution, and a direct current voltage of 35 V was applied to the clearelectric conductive film layer 2 as positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath, and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. Subsequent drying providesgood transparent green polymer film 6 deposited on the clear electricconductive layer (FIG. 2(i)). The colored polymer film 6 had a thicknessof 2 μm.

The positive type photosensitive resin layer was again exposed throughanother mask 4" having shifted pattern (FIG. 2(j)), heated and developedas described above (FIG. 2(k)), and blue electrodeposition was conductedat a direct current voltage of 30 V for 5 seconds. Subsequent rinsingand drying provide blue polymer film 7 as shown above (FIG. 2(l)). Thecolored polymer film 7 had a thickness of 2 μm.

The substrate 1 having positive type photosensitive resin layer, andred, green and blue colored layer thereon was then dipped into thepositive type photosensitive resin composition removing solution of thereference example 4 for 3 minutes with stirring. Selective elution ofthe positive type photosensitive resin layer was provided by rinsing thesubstrate with water. Subsequent drying provides the substrate 1 havingbared surface and colored layer thereon (FIG. 3(m)).

The color filter thus obtained had no coloring failure and size failure,and had improved property (see FIG. 8).

Other color filter preparation in essentially the same manner asdescribed above except that the positive type photosensitive resincomposition removing solution 2 or 3 instead of the positive typephotosensitive resin composition removing solution 1 provided comparableresults.

EXAMPLE 2

Onto a glass substrate 1 having clear electric conductive film layer 2(ITO (indium tin oxide)) thereon (FIG. 1(a)), the positive typephotosensitive resin composition of the reference example 1 was appliedusing a spinner, and the applied positive type photosensitive resincomposition was then dried to form a positive type photosensitive resinlayer 3 (FIG. 1(c)).

The layer was then exposed to a high pressure mercury lamp through mask4 having predetermined pattern (FIG. 1(d)), heated at 100° C. for 3minutes, and the exposed part of the layer was eluted with abovementioned positive type photosensitive resin composition developingsolution to bare the surface of the clear electric conductive film layer2. The substrate 1 having the bared surface (FIG. 1(e)) was then dippedinto an electrodeposition bath including red anionic electrodepositablesolution, and a direct current voltage of 30 V was applied to the clearelectric conductive film layer 2 as a positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath, and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. On the other hand, the waterinsoluble polymer deposited onto the voltage applied surface of theclear electric conductive film layer was not removed by rinsing withwater. Subsequent drying provided good transparent red polymer film 5deposited onto the clear electric conductive layer (FIG. 1(f)). Thecolored polymer film 5 had a thickness of 2 μm.

The positive type photosensitive resin layer was again exposed to thehigh pressure mercury lamp through another mask 4' having shiftedpattern (FIG. 1(g)), heated at 100° C. for 3 minutes, and developed withthe positive type photosensitive resin composition developing solutionto bare the surface of the clear electric conductive film layer 2. Thesubstrate 1 having bared surface (FIG. 1(h)) was then dipped into anelectrodeposition bath including green anionic electrodepositablesolution, and a direct current voltage of 35 V was applied to the clearelectric conductive film layer 2 as positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath, and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. Subsequent drying providesgood transparent green polymer film 6 deposited on the clear electricconductive layer (FIG. 2(i)). The colored polymer film 6 had a thicknessof 2 μm.

The positive type photosensitive resin layer was again exposed throughanother mask 4 having shifted pattern (FIG. 2(j)), heated and developedas described above (FIG. 2(k)), and blue electrodeposition was conductedat a direct current voltage of 30 V for 5 seconds. Subsequent rinsingand drying provide blue polymer film 7 as shown above (FIG. 2(l)). Thecolored polymer film 7 had a thickness of 2 μm.

The substrate 1 having positive type photosensitive resin layer, andred, green and blue colored layer thereon was then dipped into thepositive type photosensitive resin composition removing solution of thereference example 4 for 3 minutes with stirring. Selective elution ofthe positive type photosensitive resin layer was provided by rinsing thesubstrate with water. Subsequent drying provides the substrate 1 havingbared surface and colored layer thereon (FIG. 3(m)).

Finally, black electrodeposition was conducted at a direct currentvoltage of 3 V for 20 seconds. Subsequent rinsing and drying providedblack colored layer on the bared part of the clear electric conductivefilm (FIG. 2(n)). The colored polymer film had a thickness of 2 μm.

The color filter thus obtained had no coloring failure and size failure,and had improved property.

EXAMPLE 3

Onto a glass substrate 1 having clear electric conductive film layer 2(ITO (indium tin oxide)) thereon (FIG. 1(a)), the positive typephotosensitive resin composition of the reference example 1 was appliedusing a spinner, and the applied positive type photosensitive resincomposition was then dried to form a positive type photosensitive resinlayer 3 (FIG. 1(c)).

The layer was then exposed to a high pressure mercury lamp through mask4 having predetermined pattern (FIG. 1(d)), heated at 100° C. for 3minutes, and the exposed part of the layer was eluted with abovementioned positive type photosensitive resin composition developingsolution to bare the surface of the clear electric conductive film layer2. The substrate 1 having the bared surface (FIG. 1(e)) was then dippedinto an electrodeposition bath including red anionic electrodepositablesolution, and a direct current voltage of 30 V was applied to the clearelectric conductive film layer 2 as a positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath, and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. On the other hand, the waterinsoluble polymer deposited onto the voltage applied surface of theclear electric conductive film layer was not removed by rinsing withwater. Subsequent drying provided good transparent red polymer film 5deposited onto the clear electric conductive layer (FIG. 1(f)). Thecolored polymer film 5 had a thickness of 2 μm.

The positive type photosensitive resin layer was again exposed to thehigh pressure mercury lamp through another mask 4' having shiftedpattern (FIG. 1(g)), heated at 100° C. for 3 minutes, and developed withthe positive type photosensitive resin composition developing solutionto bare the surface of the clear electric conductive film layer 2. Thesubstrate 1 having bared surface (FIG. 1(h)) was then dipped into anelectrodeposition bath including green anionic electrodepositablesolution, and a direct current voltage of 35 V was applied to the clearelectric conductive film layer 2 as positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath, and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. Subsequent drying providesgood transparent green polymer film 6 deposited on the clear electricconductive layer (FIG. 2(i)). The colored polymer film 6 had a thicknessof 2 μm.

The positive type photosensitive resin layer was again exposed throughanother mask 4 having shifted pattern (FIG. 2(j)), heated and developedas described above (FIG. 2(k)), and blue electrodeposition was conductedat a direct current voltage of 30 V for 5 seconds. Subsequent rinsingand drying provide blue polymer film 7 as shown above (FIG. 2(l)). Thecolored polymer film 7 had a thickness of 2 μm.

The substrate 1 having positive type photosensitive resin layer, andred, green and blue colored layer thereon was then dipped into thepositive type photosensitive resin composition removing solution of thereference example 4 for 3 minutes with stirring. Selective elution ofthe positive type photosensitive resin layer was provided by rinsing thesubstrate with water. Subsequent drying provides the substrate 1 havingbared surface and colored layer thereon (FIG. 3(m)).

Finally, commercially available black resist composition was appliedonto the whole surface having colored layer thereon of the baredsubstrate by spin coat process, and dried (FIG. 5(v)). The surface nothaving colored layer of the substrate was then exposed to the highpressure mercury lamp, and the black resist was developed with acommercially available black resist developing solution to obtain blacklayer 11 which fills the spaces between red, green and blue color layer(FIG. 5(w)). The black layer film had a thickness of 2 μm.

The color filter thus obtained had no coloring failure and size failure,and had improved property.

EXAMPLE 4

Onto a glass substrate 1 having clear electric conductive film layer 2(ITO (indium tin oxide)) thereon (FIG. 1(a)), the positive typephotosensitive resin composition of the reference example 1 was appliedusing a spinner, and the applied positive type photosensitive resincomposition was then dried to form a positive type photosensitive resinlayer 3 (FIG. 1(c)).

The layer was then exposed to a high pressure mercury lamp through mask4 having predetermined pattern (FIG. 1(d)), heated at 100° C. for 3minutes, and the exposed part of the layer was eluted with abovementioned positive type photosensitive resin composition developingsolution to bare the surface of the clear electric conductive film layer2. The substrate 1 having the bared surface (FIG. 1(e)) was then dippedinto an electrodeposition bath including red anionic electrodepositablesolution, and a direct current voltage of 30 V was applied to the clearelectric conductive film layer 2 as a positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath, and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. On the other hand, the waterinsoluble polymer deposited onto the voltage applied surface of theclear electric conductive film layer was not removed by rinsing withwater. Subsequent drying provided good transparent red polymer film 5deposited onto the clear electric conductive layer (FIG. 1(f)). Thecolored polymer film 5 had a thickness of 2 μm.

The positive type photosensitive resin layer was again exposed to thehigh pressure mercury lamp through another mask 4' having shiftedpattern (FIG. 1(g)), heated at 100° C. for 3 minutes, and developed withthe positive type photosensitive resin composition developing solutionto bare the surface of the clear electric conductive film layer 2. Thesubstrate 1 having bared surface (FIG. 1(h)) was then dipped into anelectrodeposition bath including green anionic electrodepositablesolution, and a direct current voltage of 35 V was applied to the clearelectric conductive film layer 2 as positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath, and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. Subsequent drying providesgood transparent green polymer film 6 deposited on the clear electricconductive layer (FIG. 2(i)). The colored polymer film 6 had a thicknessof 2 μm.

The positive type photosensitive resin layer was again exposed throughanother mask 4 having shifted pattern (FIG. 2(j)), heated and developedas described above (FIG. 2(k)), and blue electrodeposition was conductedat a direct current voltage of 30 V for 5 seconds. Subsequent rinsingand drying provide blue polymer film 7 as shown above (FIG. 2(l)). Thecolored polymer film 7 had a thickness of 2 μm.

The substrate 1 having positive type photosensitive resin layer, andred, green and blue colored layer thereon was then dipped into thepositive type photosensitive resin composition removing solution of thereference example 4 for 3 minutes with stirring. Selective elution ofthe positive type photosensitive resin layer was provided by rinsing thesubstrate with water. Subsequent drying provides the substrate 1 havingbared surface and colored layer thereon (FIG. 3(m)).

Finally, the substrate 1 having the bared surface 2 was cathodized anddipped into the chromium plating bath of the reference example 5, and adirect current voltage of 5 V was applied to an lead-tin alloy anode for5 seconds to obtain a chrome plating layer 12 was formed onto the clearelectric conductive layer 2 (FIG. 6(x)).

The color filter thus obtained had no coloring failure and size failure,and had improved property.

EXAMPLE 5

Onto a glass substrate 1 having clear electric conductive film layer 2(ITO (indium tin oxide)) thereon (FIG. 1(a)), the positive typephotosensitive resin composition of the reference example 1 was appliedusing a spinner, and the applied positive type photosensitive resincomposition was then dried to form a positive type photosensitive resinlayer 3 (FIG. 1(c)).

The layer was then exposed to a high pressure mercury lamp through mask4 having predetermined pattern (FIG. 1(d)), heated at 100° C. for 3minutes, and the exposed part of the layer was eluted with abovementioned positive type photosensitive resin composition developingsolution to bare the surface of the clear electric conductive film layer2. The substrate 1 having the bared surface (FIG. 1(e)) was then dippedinto an electrodeposition bath including red anionic electrodepositablesolution, and a direct current voltage of 30 V was applied to the clearelectric conductive film layer 2 as a positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath,. and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. On the other hand, the waterinsoluble polymer deposited onto the voltage applied surface of theclear electric conductive film layer was not removed by rinsing withwater. Subsequent drying provided good transparent red polymer film 5deposited onto the clear electric-conductive layer (FIG. 1(f)). Thecolored polymer film 5 had a thickness of 2 μm.

The positive type photosensitive resin layer was again exposed to thehigh pressure mercury lamp through another mask 4' having shiftedpattern (FIG. 1(g)), heated at 100° C. for 3 minutes, and developed withthe positive type photosensitive resin composition developing solutionto bare the surface of the clear electric conductive film layer 2. Thesubstrate 1 having bared surface (FIG. 1(h)) was then dipped into anelectrodeposition bath including green anionic electrodepositablesolution, and a direct current voltage of 35 V was applied to the clearelectric conductive film layer 2 as positive electrode for 5 seconds.

Thereafter, the substrate was taken out from the bath, and rinsed withwater sufficiently. Since the electrodepositable paint placed on thepositive type photosensitive resin layer surface was not deposited, itwas removed easily by rinsing with water. Subsequent drying providesgood transparent green polymer film 6 deposited on the clear electricconductive layer (FIG. 2(i)). The colored polymer film 6 had a thicknessof 2 μm.

The positive type photosensitive resin layer was again exposed throughanother mask 4" having shifted pattern 2(j)), heated and developed asdescribed above (FIG. 2(k)), and blue electrodeposition was conducted ata direct current voltage of 30 V for 5 seconds. Subsequent rinsing anddrying provide blue polymer film 7 as shown above (FIG. 2(l)). Thecolored polymer film 7 had a thickness of 2 μm.

The substrate 1 having positive type photosensitive resin layer, andred, green and blue colored layer thereon was then dipped into thepositive type photosensitive resin composition removing solution of thereference example 4 for 3 minutes with stirring. Selective elution ofthe positive type photosensitive resin layer was provided by rinsing thesubstrate with water. Subsequent drying provides the substrate 1 havingbared surface and colored layer thereon (FIG. 3(m)).

Finally, the substrate 1 having the bared surface 2 was cathodized anddipped into the reducing electrolyte of the reference example 6, and adirect current voltage of 25 V was applied to an stainless steel plateanode for 5 seconds to form black layer 13 on the result of electricalfield reduction of the bared clear electric conductive layer 2 (FIG.7(y)).

The color filter thus obtained had no coloring failure and size failure,and had improved property.

EFFECT OF THE INVENTION

According to the present invention, a color filter having excellentdisplay quality without coloring failure and size failure is producedeven in the condition that the edge of the photosensitive coating losesphotosensitivity, and the edge of the coating leaves itself on theelectroconductive layer. Saving preparing steps is another effect of thepresent invention.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1(a)-(h) are cross sectional views of a flow sheet illustrating onepreparing process of the present invention.

FIG. 2(i)-(l) are cross sectional views of a flow sheet illustratinganother preparing process of the present invention.

FIG. 3(m) and (n) are cross sectional views of a flow sheet illustratinganother preparing process of the present invention.

FIG. 4(o)-(u) are cross sectional views of a flow sheet illustratinganother preparing process of the present invention.

FIG. 5(v) and (w) are cross sectional views of a flow sheet illustratinganother preparing process of the present invention.

FIG. 6(x) is a cross sectional view of flow sheet illustrating anotherpreparing process of the present invention.

FIG. 7(y) is a cross sectional view of a flow sheet illustrating anotherpreparing process of the present invention.

FIG. 8 is an enlarged view illustrating the surface of the color filterprepared according to the present invention, and the photograph showingthe surface is filed attached thereto.

FIG. 9 is an enlarged view illustrating the surface of the color filterprepared according to the prior art process, and the photograph showingthe surface is filed attached thereto.

We claim:
 1. A process for producing a multicolor display consistingessentially of the following steps:(I) a photosensitive resin layerformed on an electric conductive layer is exposed to light through amask having a desired pattern which is placed on the photosensitiveresin layer, and developed to bare partially the surface of the electricconductive layer; (II) a colored layer is formed on the bared surface ofthe electric conductive layer by an electrodepositing process; and (III)the above steps (I) and (II) are repeated desired times and then theremaining photosensitive resin layer is eluted with a removing solutionwhich preferentially or selectively dissolves the photosensitive layer,to bare the remaining surface of the electric conductive layer,whereinsaid photosensitive resin layer is formed from a resin compositioncomprising a polymer having branched groups unstable to carboxylic acidand a photopolymerization initiator which produces acid upon exposure tolight.
 2. The process according to claim 1, further consistingessentially of the following step after said step (III):(IV) a coloredlayer is formed on the bared remaining surface of the electricconductive layer by an electrodepositing process.
 3. The processaccording to claim 1, further consisting essentially of the followingstep after said step (III):(V) a colored layer is formed on the baredremaining surface of the electric conductive layer by a coating process.4. The process according to claim 1, further consisting essentially ofthe following step after said step (III):(VI) a colored layer is formedon the bared remaining surface of the electric conductive layer byplating a metal on the bared remaining surface.
 5. The process accordingto claim 1, further consisting essentially of the following step aftersaid step (III):(VII) the bared remaining surface of the electricconductive layer is colored by an oxidation or reduction process.